Cu电极吸附ClO4-和SO42-阴离子的表面增强拉曼光谱

G. Niaura, A. Malinauskas
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引用次数: 32

摘要

采用表面增强拉曼光谱(SERS)研究了粗糙多晶铜电极对ClO4-和SO42-阴离子的吸附。在铜电极上发现了ClO4-阴离子的物理吸附。SO42-离子的化学吸附表现为完全对称频率(从982 cm-1到967 cm-1)在吸附时的大位移和波段的显着拓宽(从8.5 cm-1到25 cm-1)。967 cm-1波段对溶液中同位素H2O-D2O交换不敏感,说明被吸附的阴离子是硫酸盐,而不是硫酸氢盐。在pH值0.3 ~ 4.5范围内,各种酸性硫酸盐溶液的光谱均以同一谱带为主。当电极电位恒定为-0.20 V时,吸附的SO42-离子的SER强度在pH范围3-4.5内逐渐降低,表明SO42-在酸性更强的介质中吸附稳定或在此pH范围内开始其他过程,如OH-吸附或表面氧化。
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Surface-enhanced Raman spectroscopy of ClO4- and SO42- anions adsorbed at a Cu electrode
The adsorption of ClO4- and SO42- anions on a roughened polycrystalline copper electrode has been studied using surface-enhanced Raman spectroscopy (SERS). It has been found that the ClO4- anion physisorbs at the copper electrode. The chemisorption of the SO42- ion has been revealed both by the large shift of the totally symmetric frequency (from 982 to 967 cm-1) upon adsorption and by the considerable broadening (from 8.5 to 25 cm-1) of the band. The 967 cm-1 band was not sensitive to the solution isotopic H2O–D2O exchange, indicating that sulfate, but not bisulfate, is the adsorbed anion. The same band dominates the spectra of various acidic sulfate solutions in pH region between 0.3 and 4.5. The SER intensity of the adsorbed SO42- ion gradually decreased in the pH range 3–4.5 at a constant electrode potential of -0.20 V, demonstrating the stabilization of SO42- adsorption in more acidic media or the beginning of other processes, such as OH- adsorption or surface oxidation in this pH range.
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