反应键合氮化硅烧结后的研究

A. Giachello , P. Popper
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引用次数: 34

摘要

反应键合氮化硅(RBSN)可用作在大气压力下约1800℃的氮气中进行后致密化过程的起始材料。所用的助烧剂类似于热压和无压烧结中使用的助烧剂(例如MgO, Y2O3)。它们可以在氮化之前添加到硅粉中,或者在MgO的情况下,通过将蒸汽扩散到预成型的RBSN中。高密度(理论上的98.5%)已经实现,同时只有6.2%的收缩。瞬时强度约为1000 MN/m2;高温的强度取决于脱硝作用。因此,该工艺提供了通过注塑成型的复杂部件,烧结后的强度值与热压氮化硅相似。
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Post-sintering of reaction-bonded silicon nitride

Reaction-bonded silicon nitride, RBSN, may be used as the starting material for a post-densification process carried out at about 1800°C in nitrogen at atmospheric pressure. The sintering aids used are similar to those employed in hot pressing and pressureless sintering (e.g. MgO, Y2O3). They may be added to the silicon powder before nitridation or, in the case of MgO, by diffusing the vapour into preformed RBSN. High densities (98.5% theoretical) have been achieved accompanied by a shrinkage of only 6.2%. The strength at R.T. was about 1000 MN/m2; the strength at H.T. depends on devitrification. The process thus offers complex components to be formed by injection moulding, with strength values after sintering similar to those of hot-pressed silicon nitride.

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