低温下Si(111)和Ge(111)切割表面的一些性质

V.A. Grazhulis, V.F. Kuleshov
{"title":"低温下Si(111)和Ge(111)切割表面的一些性质","authors":"V.A. Grazhulis,&nbsp;V.F. Kuleshov","doi":"10.1016/0378-5963(85)90032-7","DOIUrl":null,"url":null,"abstract":"<div><p>Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10<sup>-10</sup> Torr), liquid N<sub>2</sub>, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.</p></div>","PeriodicalId":100105,"journal":{"name":"Applications of Surface Science","volume":"22 ","pages":"Pages 14-24"},"PeriodicalIF":0.0000,"publicationDate":"1985-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0378-5963(85)90032-7","citationCount":"2","resultStr":"{\"title\":\"Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures\",\"authors\":\"V.A. Grazhulis,&nbsp;V.F. Kuleshov\",\"doi\":\"10.1016/0378-5963(85)90032-7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10<sup>-10</sup> Torr), liquid N<sub>2</sub>, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.</p></div>\",\"PeriodicalId\":100105,\"journal\":{\"name\":\"Applications of Surface Science\",\"volume\":\"22 \",\"pages\":\"Pages 14-24\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1985-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/0378-5963(85)90032-7\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applications of Surface Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/0378596385900327\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applications of Surface Science","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/0378596385900327","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

摘要

介绍了在超高真空(~ 10-10 Torr)、液态N2和液态He条件下晶体解理制备Ge(111)和Si(111)表面的低温实验结果,并进行了简要讨论。对其中的一些结果进行了重新分析,并提出了新的解释。
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Some properties of Si(111) and Ge(111) cleaved surfaces at low temperatures

Low-temperature experimental results on Ge(111) and Si(111) surfaces prepared by crystal cleavage in ultra-high vacuum (∼ 10-10 Torr), liquid N2, and liquid He are presented and briefly discussed. Some of these results are reanalyzed and new interpretations are suggested.

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