{"title":"用波动器同时测量电子束大小和散度","authors":"B. Yang, A. Lumpkin","doi":"10.1109/PAC.1999.794406","DOIUrl":null,"url":null,"abstract":"We present the simultaneous measurement of beam divergence and source size based on the APS diagnostic undulator line. A 300-/spl mu/m-thick Si(400) crystal monochromator is used to measure the divergence with a resolution down to 3 /spl mu/rad (1 /spl mu/rad with the third harmonic). X-rays transmitted through the crystal are simultaneously used by a pinhole camera to measure the beam size, at a resolution of about 40 /spl mu/m. We demonstrate that this measurement of emittance is robust against fluctuations of lattice functions due to a partial cancellation of systematic errors present in each of the measurements.","PeriodicalId":20453,"journal":{"name":"Proceedings of the 1999 Particle Accelerator Conference (Cat. No.99CH36366)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1999-04-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Simultaneous measurement of electron beam size and divergence with an undulator\",\"authors\":\"B. Yang, A. Lumpkin\",\"doi\":\"10.1109/PAC.1999.794406\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present the simultaneous measurement of beam divergence and source size based on the APS diagnostic undulator line. A 300-/spl mu/m-thick Si(400) crystal monochromator is used to measure the divergence with a resolution down to 3 /spl mu/rad (1 /spl mu/rad with the third harmonic). X-rays transmitted through the crystal are simultaneously used by a pinhole camera to measure the beam size, at a resolution of about 40 /spl mu/m. We demonstrate that this measurement of emittance is robust against fluctuations of lattice functions due to a partial cancellation of systematic errors present in each of the measurements.\",\"PeriodicalId\":20453,\"journal\":{\"name\":\"Proceedings of the 1999 Particle Accelerator Conference (Cat. No.99CH36366)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-04-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 1999 Particle Accelerator Conference (Cat. No.99CH36366)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PAC.1999.794406\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 1999 Particle Accelerator Conference (Cat. No.99CH36366)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PAC.1999.794406","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Simultaneous measurement of electron beam size and divergence with an undulator
We present the simultaneous measurement of beam divergence and source size based on the APS diagnostic undulator line. A 300-/spl mu/m-thick Si(400) crystal monochromator is used to measure the divergence with a resolution down to 3 /spl mu/rad (1 /spl mu/rad with the third harmonic). X-rays transmitted through the crystal are simultaneously used by a pinhole camera to measure the beam size, at a resolution of about 40 /spl mu/m. We demonstrate that this measurement of emittance is robust against fluctuations of lattice functions due to a partial cancellation of systematic errors present in each of the measurements.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
