SiH4-CH4-H2混合气体PECVD中的粉末耗散

Le Journal De Physique Colloques Pub Date : 1995-06-01 DOI:10.1051/JPHYSCOL:19955133

P. Rava, G. Crovini, F. Demichelis, F. Giorgis, R. Galloni, R. Rizzoli, C. Summonte

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引用次数: 1

摘要

考虑射频电路中功率损耗的影响，用减法测量了13.56 MHz激励下sih4 - ch4 - h2等离子体在不同气体比下的有效耗散功率。耗散功率随ch4浓度的增加而增大，随h2浓度的增加而减小。测量了在各种沉积条件下沉积的薄膜的光学、电学和缺陷特性，并将其与耗散功率相关联。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Powder Dissipation in PECVD for SiH4-CH4-H2 Gas Mixtures

The effective dissipated power in SiH 4 -CH 4 -H 2 plasmas excited by 13.56 MHz has been measured for different gas ratios using a subtractive technique to take into account the effects of power losses in the rf circuit. It is found that the dissipated power in general increases with increasing CH 4 concentration and decreases with increasing H 2 concentration. Optical, electrical and defective properties of films deposited under a wide range of deposition conditions have been measured and correlated with dissipated power.

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Le Journal De Physique Colloques

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