Zhang Yuting , Wang Xin , Liu Pengchuang , Zeng Gang , Pang Xiaoxuan , Jia Jianping , Sheng Liusi , Zhang Pengcheng
{"title":"U-10wt% Zr/Zircaloy-4扩散偶联反应层的微观结构表征和生长动力学","authors":"Zhang Yuting , Wang Xin , Liu Pengchuang , Zeng Gang , Pang Xiaoxuan , Jia Jianping , Sheng Liusi , Zhang Pengcheng","doi":"10.1016/S1875-5372(18)30208-X","DOIUrl":null,"url":null,"abstract":"<div><p>To investigate the compatibility and diffusion behavior between U-Zr alloys and Zr-4 alloys, solid-to-solid U-10wt% Zr/Zr-4 diffusion couples were assembled by vacuum hot pressing and then annealed under vacuum at temperatures ranging from 580 °C to 1100 °C for various time. Scanning and transmission electron microscopes were employed to analyze the microstructures and composition profiles at the interfaces of the couples. The compatibility between the two alloys was investigated. <em>δ</em>-UZr<sub>2</sub> and ∼20-nm-thin U-rich layers existed in the vacuum-hot-pressed samples. The interdiffusion coefficient constant and activation energy are found to be (4.23±0.63)×10<sup>−6</sup> m<sup>2</sup>/s and (160.73±1.67) kJ/mol, respectively. The interdiffusion coefficients of the U-10wt% Zr/Zr-4 alloy couples are higher than those of U—Zr alloys, especially at low temperature.</p></div>","PeriodicalId":21056,"journal":{"name":"稀有金属材料与工程","volume":null,"pages":null},"PeriodicalIF":0.6000,"publicationDate":"2018-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S1875-5372(18)30208-X","citationCount":"0","resultStr":"{\"title\":\"Microstructural Characterization and Growth Kinetics of the Reaction Layer in U-10wt% Zr/Zircaloy-4 Diffusion Couples\",\"authors\":\"Zhang Yuting , Wang Xin , Liu Pengchuang , Zeng Gang , Pang Xiaoxuan , Jia Jianping , Sheng Liusi , Zhang Pengcheng\",\"doi\":\"10.1016/S1875-5372(18)30208-X\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>To investigate the compatibility and diffusion behavior between U-Zr alloys and Zr-4 alloys, solid-to-solid U-10wt% Zr/Zr-4 diffusion couples were assembled by vacuum hot pressing and then annealed under vacuum at temperatures ranging from 580 °C to 1100 °C for various time. Scanning and transmission electron microscopes were employed to analyze the microstructures and composition profiles at the interfaces of the couples. The compatibility between the two alloys was investigated. <em>δ</em>-UZr<sub>2</sub> and ∼20-nm-thin U-rich layers existed in the vacuum-hot-pressed samples. The interdiffusion coefficient constant and activation energy are found to be (4.23±0.63)×10<sup>−6</sup> m<sup>2</sup>/s and (160.73±1.67) kJ/mol, respectively. The interdiffusion coefficients of the U-10wt% Zr/Zr-4 alloy couples are higher than those of U—Zr alloys, especially at low temperature.</p></div>\",\"PeriodicalId\":21056,\"journal\":{\"name\":\"稀有金属材料与工程\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.6000,\"publicationDate\":\"2018-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/S1875-5372(18)30208-X\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"稀有金属材料与工程\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S187553721830208X\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"稀有金属材料与工程","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S187553721830208X","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Microstructural Characterization and Growth Kinetics of the Reaction Layer in U-10wt% Zr/Zircaloy-4 Diffusion Couples
To investigate the compatibility and diffusion behavior between U-Zr alloys and Zr-4 alloys, solid-to-solid U-10wt% Zr/Zr-4 diffusion couples were assembled by vacuum hot pressing and then annealed under vacuum at temperatures ranging from 580 °C to 1100 °C for various time. Scanning and transmission electron microscopes were employed to analyze the microstructures and composition profiles at the interfaces of the couples. The compatibility between the two alloys was investigated. δ-UZr2 and ∼20-nm-thin U-rich layers existed in the vacuum-hot-pressed samples. The interdiffusion coefficient constant and activation energy are found to be (4.23±0.63)×10−6 m2/s and (160.73±1.67) kJ/mol, respectively. The interdiffusion coefficients of the U-10wt% Zr/Zr-4 alloy couples are higher than those of U—Zr alloys, especially at low temperature.