Chemical Vapor Deposition

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期刊缩写：

Chem. Vap. Deposition copy

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ISSN：

ISSN是由8个数字组成的编码，旨在识别各种报纸、专业杂志、画报、期刊，无论其性质或载体版本（纸版及电子版）。

print: 0948-1907
on-line: 0948-1907

研究领域：

工程技术-材料科学：膜

Gold OA文章占比：

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0.00%

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0.00%

期刊官网：

http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-3862 http://www.cvd-journal.de/

期刊介绍英文：

Chemical Vapor Deposition (CVD) publishes Reviews, Short Communications, and Full Papers on all aspects of chemical vapor deposition and related technologies, along with other articles presenting opinion, news, conference information, and book reviews. All papers are peer-reviewed. The journal provides a unified forum for chemists, physicists, and engineers whose publications on chemical vapor deposition have in the past been spread over journals covering inorganic chemistry, materials chemistry, organometallics, applied physics and semiconductor technology, thin films, and ceramic processing.