Advances in Patterning Materials and Processes XL

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Advances in Patterning Materials and Processes XL - 最新文献

The EUV lithography resist screening activities in H2-2022

Pub Date : 2023-05-29 DOI: 10.1117/12.2660859 A. Develioglu, T. Allenet, M. Vockenhuber, L. van Lent-Protasova, I. Mochi, Y. Ekinci, D. Kazazis

Track integrated backside cleaning solution: impact of backside contamination on printing distortions

Pub Date : 2023-05-29 DOI: 10.1117/12.2658418 Andreia Santos, Wesley Zanders, Elke Caron, M. Harumoto, J. Vandereyken, J. Hermans, V. Truffert, S. Halder, Ronald Otten, Leon van Dijk, Richard J. F. van Haren

Front Matter: Volume 12498

Pub Date : 2023-05-22 DOI: 10.1117/12.2685107

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