2006 IEEE International Integrated Reliability Workshop Final Report

Product Reliability Trends, Derating Considerations and Failure Mechanisms with Scaled CMOS

Pub Date : 2006-10-16 DOI: 10.1109/IRWS.2006.305234 M. White, D. Vu, Due Nguyen, R. Ruiz, Yuan Chen, J. Bernstein

Ultra-thin Gate Oxide Lifetime Projection and Degradation Mechanism beyond 90 nm CMOS Technology

Pub Date : 2006-10-01 DOI: 10.1109/IRWS.2006.305242 Cheng-li Lin, T. Kao, Ju-ping Chen, J.Y.C. Yang, K. Su

Modeling and Characterization of Bias Stress-Induced Instability of SiC MOSFETs

Pub Date : 2006-10-01 DOI: 10.1109/IRWS.2006.305235 A. Lelis, S. Potbhare, D. Habersat, G. Pennington, N. Goldsman