2020 China Semiconductor Technology International Conference (CSTIC)

Surface Smoothing and Roughening Effects of High-K Dielectric Materials Deposited by Atomic Layer Deposition and Their Significance for MIM Capacitors Used in Dram Technology Part II

Pub Date : 2020-06-26 DOI: 10.1109/CSTIC49141.2020.9282429 W. Lau

A Unified 4H-SIC Mosfets TDDB Lifetime Model Based on Leakage Current Mechanism

Pub Date : 2020-06-26 DOI: 10.1109/CSTIC49141.2020.9282518 Hua Chen, Pan Zhao, Jiahao Liu, Yusen Su, Tuo Zheng, Hao Ni, Liang He

From Microns to Nanometers: The IRDS and AMC Control

Pub Date : 2020-06-26 DOI: 10.1109/CSTIC49141.2020.9282458 C. Muller, Henry Yu, D. Lu