T. Fangsuwannarak, P. Krongarrom, J. Kaewphoka, S. Rattanachan
{"title":"Bismuth doped ZnO films as anti-reflection coatings for solar cells","authors":"T. Fangsuwannarak, P. Krongarrom, J. Kaewphoka, S. Rattanachan","doi":"10.1109/ECTICON.2013.6559582","DOIUrl":null,"url":null,"abstract":"For fabrication of zinc oxide-based optoelectronic devices, especially solar cells, the development of cost-effective and low-temperature synthesis techniques for the deposition of high quality ZnO films is paramount. In this paper, incorporating Bi-doped ZnO films was prepared by the sol-gel spin coating method. The optical constants of the prepared thin films depend on the synthesis conditions. XRD measurement show that a high quality of ZnO:Bi nanostructure have preferably grow along (002) direction. The ZnO:Bi thin films were fabricated as antireflection coatings (ARCs) for solar cells. The nanoscale morphology altered through the different Bi content in the films, has a great effect on the macroscopic ARC performance. The optical constants as refractive index and extinction coefficient are determined through the transmittance and reflectance spectra. Textured ZnO:Bi films with average thickness ranging from 87 nm to 94 nm present a broadband reflection suppression from 400 to 1100 nm wavelength. The refractive index around 1.31-1.47 estimated is appropriate to an ARC layer for Si solar cells.","PeriodicalId":273802,"journal":{"name":"2013 10th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology","volume":"7 S1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 10th International Conference on Electrical Engineering/Electronics, Computer, Telecommunications and Information Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTICON.2013.6559582","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
For fabrication of zinc oxide-based optoelectronic devices, especially solar cells, the development of cost-effective and low-temperature synthesis techniques for the deposition of high quality ZnO films is paramount. In this paper, incorporating Bi-doped ZnO films was prepared by the sol-gel spin coating method. The optical constants of the prepared thin films depend on the synthesis conditions. XRD measurement show that a high quality of ZnO:Bi nanostructure have preferably grow along (002) direction. The ZnO:Bi thin films were fabricated as antireflection coatings (ARCs) for solar cells. The nanoscale morphology altered through the different Bi content in the films, has a great effect on the macroscopic ARC performance. The optical constants as refractive index and extinction coefficient are determined through the transmittance and reflectance spectra. Textured ZnO:Bi films with average thickness ranging from 87 nm to 94 nm present a broadband reflection suppression from 400 to 1100 nm wavelength. The refractive index around 1.31-1.47 estimated is appropriate to an ARC layer for Si solar cells.