The role of cold sonicated development scenarios for achieving ultradense and high aspect ratio for optical metamaterial applications

Abstract

We present a systematic study of different sonicated cold development scenarios for the purpose of achieving high density optical metamaterial. High aspect ratio sub-15-nm dots at pitch as small as 40 nm are successfully demonstrated for 110-nm thick resist at low exposure dose. Some of the key results include sub-15-nm gold nanodots at 40-nm pitch and high density optical metamaterial (with only ~30nm separation between two adjacent resonators).