Study on Abnormal Gate Structures of GaN HEMT Devices

Zhenglian Chen, Guojian Shao, Tao Chen, Bin Ren, Changmei Zhang, Jun Sun
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Abstract

In this paper, the abnormal gate structures of GaN HEMT devices is analyzed and classified. The abnormal manifestations of the broken gate device are analyzed by DC test, optical microscope and scanning electron microscope, including the loss of gate foot, the loss of some gate foot and gate cap, the complete loss of gate structure and the loss of field plate. By analyzing these abnormal devices, we can judge whether there is a lack of gate structure in the failed devices, and then put forward solutions and optimization schemes.
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GaN HEMT器件异常栅结构的研究
本文对GaN HEMT器件的异常栅结构进行了分析和分类。通过直流试验、光学显微镜和扫描电镜分析了断栅装置的异常表现,包括断栅脚的损失、部分断栅脚和断栅帽的损失、断栅结构的完全损失和场板的损失。通过分析这些异常器件,可以判断故障器件中是否存在栅结构缺失,进而提出解决方案和优化方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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