Scaling effect and circuit type dependence of neutron induced single event transient

Hideyuki Nakamura, Taiki Uemura, Kan Takeuchi, Toshikazu Fukuda, Shigetaka Kumashiro, Tohru Mogami
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引用次数: 11

Abstract

Neutron induced single event transient (SET) has been measured on NAND and inverter (INV) chain with changing fan-out, drive strength, size of drain diffusion area, temperature and VDD on 40nm and 90nm bulk CMOS technology. As the pulse width distribution varies with the length of SET target chain as well, it is important to use the chain length similar with the actual logic circuits. Using tens of stages of target chain, pulses wider than 150ps have been rarely observed. The results of the measurement show that the SER of SET changes depending on the cell type and fan-out. SER of SET in combinational logic circuits decreases by half from 90nm to 40nm for the same gate count and the same clock frequency.
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中子诱导单事件瞬态的标度效应和电路类型依赖性
在40nm和90nm块体CMOS技术上,通过改变扇出、驱动强度、漏极扩散面积大小、温度和VDD,在NAND和逆变器(INV)链上测量了中子诱导的单事件瞬态(SET)。由于脉冲宽度分布也随SET靶链长度的变化而变化,因此使用与实际逻辑电路相似的链长是很重要的。使用数十级的目标链,很少观察到宽度超过150ps的脉冲。测量结果表明,SET的SER随细胞类型和扇出而变化。在相同的门数和相同的时钟频率下,组合逻辑电路中SET的SER从90nm降至40nm,降低了一半。
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