{"title":"Time-Resolved Electron Density Measurements of the Rise Cycle in a Pulsed Inductively Coupled Plasma","authors":"J. Brandon, K. Ford, D. Peterson, S. Shannon","doi":"10.1109/PLASMA.2017.8496046","DOIUrl":null,"url":null,"abstract":"Pulsed low temperature plasmas are an area of recent interest in semiconductor manufacturing applications because they offer a new set of available chemistry when compared to steady state operation. Most work has focused on the transient behavior of these plasmas at the transition from power on to power off. The dynamics of the transition from power off to power on is equally important for process control as it contributes to electron temperature increases, voltage variation, and discharge impedance transients that can all impact application performance. Further, dynamic feedback mechanisms to the external circuitry have been an area of little investigation during the power-on portion of the pulsing cycle.","PeriodicalId":145705,"journal":{"name":"2017 IEEE International Conference on Plasma Science (ICOPS)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2017-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 IEEE International Conference on Plasma Science (ICOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.2017.8496046","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Pulsed low temperature plasmas are an area of recent interest in semiconductor manufacturing applications because they offer a new set of available chemistry when compared to steady state operation. Most work has focused on the transient behavior of these plasmas at the transition from power on to power off. The dynamics of the transition from power off to power on is equally important for process control as it contributes to electron temperature increases, voltage variation, and discharge impedance transients that can all impact application performance. Further, dynamic feedback mechanisms to the external circuitry have been an area of little investigation during the power-on portion of the pulsing cycle.