Investigation of structural, morphological and optical properties of GaN/AlGaN heterostructures on Si

Irma Saraswati, Nr. Poepawati, Wigajatri P. Retno, El Hadj Dogheche, Didier Decoster, S. Ko, Yong-Hoon Cho, Laurence Considine, D. Pavlidis
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引用次数: 2

Abstract

A good justification for gallium nitride on silicone is the potential for integrated optoelectronic circuits and for the low cost bring by growth of GaN on a large size wafers. Actually, the application interest for GaN/Si is power electronics. This work focused on the optimization of the growth process for GaN/Si and the relation between the structure and the optical properties. Using the guided wave prism coupling technique, we have fully established the index dispersion of GaN at room temperature and its temperature dependence in the wavelength range 0.4 to 1.5μm. We report a slightly low temperature dependence. Results demonstrated excellent waveguide properties of GaN on silicon with optical propagation loss below 1dB/cm. We compared trhe results on Si with those on sapphire. This opens a real opportunity of future device using this technology.
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Si上GaN/AlGaN异质结构的结构、形态和光学性质研究
有机硅上氮化镓的一个很好的理由是集成光电电路的潜力,以及在大尺寸晶圆上生长氮化镓所带来的低成本。实际上,GaN/Si的应用兴趣是电力电子。本文主要研究了GaN/Si生长过程的优化及其结构与光学性质的关系。利用导波棱镜耦合技术,我们在0.4 ~ 1.5μm波长范围内完全建立了GaN在室温下的折射率色散及其温度依赖性。我们报告了稍低的温度依赖性。结果表明,硅基GaN具有良好的波导性能,光传输损耗低于1dB/cm。我们比较了硅和蓝宝石上的结果。这为未来使用该技术的设备打开了一个真正的机会。
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