Synthesis of Porous Silicon, Nickel and Carbon Layers by Vapor Phase Dealloying

S. Saager, B. Scheffel, T. Modes, O. Zywitzki
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引用次数: 1

Abstract

Abstract Porous thin films have various application fields, e.g., for energy conversion in fuel cells, energy storage in lithium ion batteries or supercapacitors as well for catalysis, filtration and sensing. We synthesized porous thin films by co-evaporating a low-vapor-pressure material (e.g., Si, Ni or C) together with zinc and depositing a compact layer of resulting composite. High-rate deposition process up to 100 nm/s was realized by electron beam physical vapor deposition (EB-PVD) of the materials from two graphite crucibles with a fast deflected electron beam in high vacuum. Immediately after deposition, the coated substrates were heated up in vacuum to a temperature above 500 °C and thereby zinc is removed selectively. Due to its higher vapor pressure against that of remaining component, zinc is expelled from the layer and vacancies are generated by so called vapor phase dealloying (VPD). We investigated the feasibility of VPD process for the elements silicon, nickel and carbon. The elemental composition and the morphology of the layers prior and after thermal annealing were analyzed by scanning electron microscopy, by energy-dispersive X-ray spectrometry and by X-ray diffraction.
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气相脱合金法制备多孔硅、镍、碳层
多孔薄膜具有多种应用领域,如燃料电池中的能量转换、锂离子电池或超级电容器中的能量存储以及催化、过滤和传感等。我们通过将低蒸汽压材料(如Si, Ni或C)与锌一起共蒸发并沉积一层致密的复合材料来合成多孔薄膜。在高真空条件下,利用快速偏转电子束对两个石墨坩埚中的材料进行电子束物理气相沉积(EB-PVD),实现了高达100 nm/s的高速率沉积过程。沉积后,立即在真空中加热到500°C以上的温度,从而选择性地去除锌。由于其相对于剩余组分的蒸气压较高,锌从层中排出,并通过所谓的气相脱合金(VPD)产生空位。研究了用VPD工艺制备硅、镍和碳元素的可行性。采用扫描电子显微镜、x射线能谱仪和x射线衍射仪分析了热处理前后各层的元素组成和形貌。
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