Determination of Interface Roughness Using A Wavelength Scanning TIS Instrument

D. Ronnow, M. Bergkvist, A. Roos, C. Ribbing
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Abstract

Optical scattering from surface micro irregularities at a specific wavelength is directly related to the RMS-roughness value of the surface1. It is usually measured by a TIS (Total Integrated Scatter) instrument. In its’ conventional application this method can only be used to investigate the front surface of opaque samples. In the case of transparent samples or samples coated with a transparent film, one must handle two scattering interfaces as well as possible interference effects in the film. The resulting light scattering cannot be described by the standard TIS equation. By combining the scalar scattering theory with the Fresnel formalism we have obtained a model which predicts the scattering from a double layer as a function of wavelength. By fitting model calculations to experimental scattering spectra with the interface roughness values as parameters we can extract the rms-roughness values of the two interfaces. The model has been described elsewhere2. Using the scattering spectra and such fitting calculations we can conveniently, and non-destructively, determine the RMS-roughness of a "hidden" interface.
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用波长扫描TIS仪器测定界面粗糙度
表面微不规则性在特定波长的光散射与表面的rms -粗糙度值直接相关1。通常用全积分散射仪来测量。在其传统应用中,该方法只能用于研究不透明样品的前表面。在透明样品或涂有透明薄膜的样品的情况下,必须处理两个散射界面以及薄膜中可能的干涉效应。由此产生的光散射不能用标准的TIS方程来描述。将标量散射理论与菲涅耳形式理论相结合,得到了双层散射随波长变化的模型。以界面粗糙度值为参数,将模型计算拟合到实验散射光谱中,可以提取两个界面的均方根粗糙度值。该模型已在其他地方描述过。利用散射光谱和拟合计算,我们可以方便地、非破坏性地确定“隐藏”界面的rms -粗糙度。
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