Kaifeng Wu, Xuhan Dai, Mengyuan Zhao, Hong Wang, G. Ding
{"title":"A novel and reliable patterning technology with nickel foil on curved surfaces","authors":"Kaifeng Wu, Xuhan Dai, Mengyuan Zhao, Hong Wang, G. Ding","doi":"10.1109/INEC.2016.7589455","DOIUrl":null,"url":null,"abstract":"A new fabrication technology utilizing the nickel foil as the flexible mask for the non-planar surface patterning is presented. Compared with the traditional patterning on the planar substrates, the versatile micro-fabrication method based on the re-usable nickel membrane mask, has patterned on the curve surface. We shape the pattern in the nickel foil by the laser cutting. It allow for fabrication on a wide range of substrates, enabling feature line widths down to 50 μm. The nickel foil masks, gaining reconversion as force is removed, can be wrapped precisely on the targeted curve substrate.","PeriodicalId":416565,"journal":{"name":"2016 IEEE International Nanoelectronics Conference (INEC)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Nanoelectronics Conference (INEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INEC.2016.7589455","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
A new fabrication technology utilizing the nickel foil as the flexible mask for the non-planar surface patterning is presented. Compared with the traditional patterning on the planar substrates, the versatile micro-fabrication method based on the re-usable nickel membrane mask, has patterned on the curve surface. We shape the pattern in the nickel foil by the laser cutting. It allow for fabrication on a wide range of substrates, enabling feature line widths down to 50 μm. The nickel foil masks, gaining reconversion as force is removed, can be wrapped precisely on the targeted curve substrate.