{"title":"Contamination Studies of XUV Reflecting Surfaces for Projection Lithography*","authors":"B. Newnam, M. L. Scott","doi":"10.1364/sxray.1992.pd3","DOIUrl":null,"url":null,"abstract":"The results of carbon and oxide contamination experiments with Al, Si, Rh, and Ag films and surfaces quantify certain film growth rates and parameter dependences.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.pd3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The results of carbon and oxide contamination experiments with Al, Si, Rh, and Ag films and surfaces quantify certain film growth rates and parameter dependences.
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