{"title":"X-ray Production Efficiency at 130 Å from Laser-Produced Plasmas","authors":"R. Kauffman, D. Phillion","doi":"10.1364/sxray.1991.thc1","DOIUrl":null,"url":null,"abstract":"Laser-produced sources for soft x-ray projection lithography require high brightness in a narrow x-ray band in the region of high reflectivity for multilayer optics. Lasers will also probably be of only modest power matching near term laser technology development for high efficiency, high repetition rate lasers. Little experimental work has been done on characterizing x-ray emission below 300 eV at laser irradiations of a Joule or less. Experimental data will be needed over a large range of laser parameters including wavelength, intensity, and pulse width in order to assess the relative merits of any laser system proposed as a source for soft x-ray projection lithography.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"157 3","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.thc1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6
Abstract
Laser-produced sources for soft x-ray projection lithography require high brightness in a narrow x-ray band in the region of high reflectivity for multilayer optics. Lasers will also probably be of only modest power matching near term laser technology development for high efficiency, high repetition rate lasers. Little experimental work has been done on characterizing x-ray emission below 300 eV at laser irradiations of a Joule or less. Experimental data will be needed over a large range of laser parameters including wavelength, intensity, and pulse width in order to assess the relative merits of any laser system proposed as a source for soft x-ray projection lithography.
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