Degradation and recovery of high-speed SiGe HBTs under very high reverse EB stress conditions

G. Sasso, N. Rinaldi, G. Fischer, B. Heinemann
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引用次数: 4

Abstract

Hot-carrier induced degradation and post-stress recovery of 240/300 fT/fMAX SiGe HBTs are investigated. The investigation includes the impact of stress conditions and lateral scaling. Self-heating is employed as a means to investigate thermal-induced recovery activation and rate.
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高速SiGe HBTs在非常高的反向EB应力条件下的降解和恢复
研究了240/300 fT/fMAX SiGe HBTs的热载流子诱导降解和应力后恢复。研究包括应力条件和横向结垢的影响。采用自加热作为研究热致回收激活和速率的手段。
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A broad-band BiCMOS transmitter front-end for 27–36GHz phased array systems Degradation and recovery of high-speed SiGe HBTs under very high reverse EB stress conditions Radio-frequency flexible electronics: Transistors and passives Ultra-low noise and low power 18.7 GHz radiometer LNAs in a 0.5 THz SiGe technology utilizing back-side etched inductors High-resistivity SiGe BiCMOS technology development
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