Control of Short-Channel Effects in GaN/AlGaN HFETs

M. Uren, D. Hayes, R. Balmer, D. Wallis, K. Hilton, J. O. Maclean, T. Martin, C. Roff, P. McGovern, J. Benedikt, P. Tasker
{"title":"Control of Short-Channel Effects in GaN/AlGaN HFETs","authors":"M. Uren, D. Hayes, R. Balmer, D. Wallis, K. Hilton, J. O. Maclean, T. Martin, C. Roff, P. McGovern, J. Benedikt, P. Tasker","doi":"10.1109/EMICC.2006.282751","DOIUrl":null,"url":null,"abstract":"GaN/AlGaN HEMTs can suffer from short channel effects as a result of insufficient buffer doping. The paper show that controlled iron doping of the GaN buffer during MOVPE growth can suppress all short-channel effects in 0.25mum gate length devices. The authors show that optimised iron doping has no effect on the RF output power or on the knee walkout (current-slump), but significantly improves the power added efficiency","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"34","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 European Microwave Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EMICC.2006.282751","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 34

Abstract

GaN/AlGaN HEMTs can suffer from short channel effects as a result of insufficient buffer doping. The paper show that controlled iron doping of the GaN buffer during MOVPE growth can suppress all short-channel effects in 0.25mum gate length devices. The authors show that optimised iron doping has no effect on the RF output power or on the knee walkout (current-slump), but significantly improves the power added efficiency
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
GaN/AlGaN hfet中短通道效应的控制
由于缓冲掺杂不足,GaN/AlGaN hemt可能遭受短通道效应。研究表明,在MOVPE生长过程中,在GaN缓冲液中掺杂铁可以抑制0.25 μ m栅长器件中的所有短沟道效应。作者表明,优化后的铁掺杂对射频输出功率或膝脱(电流暴跌)没有影响,但显著提高了功率附加效率
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Capabilities of a 10 GHz MEMS based VCO CMOS Large Signal and RF Noise Model for CAD LF noise analysis of InP/GaAsSb/InP and InP/InGaAs/InP HBTs Temperature analysis of AlGaN/GaN High-Electron-Mobility Transistors using micro-Raman scattering spectroscopy and Transient Interferometric Mapping Compact RF Modeling of Multiple-Gate MOSFETs
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1