Cumulation effect of an electron beam generated in a high-voltage nanosecond discharge plasma in vacuum and gas diodes

M. Lomaev, V. Tarasenko, Alexander V. Diatlov, A. Burachenko
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Abstract

Cumulation effect of a beam of runaway electrons formed in a high-voltage nanosecond discharge in air at pressures of 3-105 Pa and discharge gap length d of 1 - 5 mm was studied. Optimal conditions of the effect in discharge gap with a tubular potential cathode and grounded flat anode was achieved at an air pressure of ~ 5 Pa and d of 2.7 mm. An electron beam current pulse was recorded behind a foil anode with high (up to ~ 80 ps) time resolution. It was found that, due to the cumulation effect, a through hole is formed in an aluminum foil 20 μm thick after 2-3 discharge pulses. The electron beam was found to register around the zone of maximum beam current density as well. As follows
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高压纳秒放电等离子体在真空和气体二极管中产生电子束的累积效应
研究了在压力为3 ~ 105pa、放电间隙长度为1 ~ 5mm的高压纳秒放电条件下,逃逸电子束在空气中形成的累积效应。在气压为~ 5 Pa、d为2.7 mm的条件下,获得了管状电位阴极和接地平面阳极放电间隙的最佳效果。电子束电流脉冲被记录在箔阳极后面,具有高(高达~ 80ps)的时间分辨率。结果表明,在2 ~ 3次放电脉冲后,由于累积效应,在20 μm厚的铝箔上形成通孔。电子束也在最大束流密度区域附近注册。如下
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