Development of hybrid measuring system for the complex micro-arrayed surface

T. Guo, Zhenshan Sun, Jinping Chen, Xing Fu, Xiaotang Hu
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Abstract

As the ultra-precision machining technology is developing in various directions and evolving into a higher level, the micro-nano measurement technology is also developing constantly. According to the different manufacturing processes and texture of measurement objects, the requirements of micro-nano measurement technology vary a lot. Optical Microscopy (OM), Scanning Probe Microscopy (SPM) or Scanning Electron Microscopy (SEM) cannot meet requirements of high efficiency, high resolution and three-dimensional morphology characteristics obtaining at the same time. Hence a hybrid measuring system including the Atomic Force Microscopy (AFM) and vertical scanning white-light interferometry is built. The measurement function of the dual feedback AFM system was verified by scanning a one-dimensional grid and the measurement function of white light vertical scanning interferometer was verified by measuring the step structure and comparing it with a three-dimensional optical profiler. And then the micro-arrayed structure is measured by white light vertical scanning interferometry. The vertices of the micro-arrayed unit structure is scanned by using AFM in the same coordinate system to verify the complex measurement function of the system on the complex micro-arrayed surface.
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复杂微阵列表面混合测量系统的研制
随着超精密加工技术向各个方向发展并向更高水平演进,微纳测量技术也在不断发展。根据测量对象的制造工艺和质地的不同,对微纳测量技术的要求也有很大的不同。光学显微镜(OM)、扫描探针显微镜(SPM)或扫描电子显微镜(SEM)不能同时满足高效率、高分辨率和三维形貌特征获取的要求。因此,建立了原子力显微镜(AFM)和垂直扫描白光干涉测量的混合测量系统。通过扫描一维网格验证了双反馈AFM系统的测量功能,通过测量台阶结构并与三维光学剖面仪进行对比验证了白光垂直扫描干涉仪的测量功能。然后用白光垂直扫描干涉测量法对微阵列结构进行测量。利用AFM在同一坐标系下对微阵列单元结构的顶点进行扫描,验证系统在复杂微阵列表面上的复杂测量功能。
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