In-vacuum work function measurement system

M. Hamanaka, Vinícius do Lago Pimentel, Wellington Oliveira Avelino, Viviane Nogueira Hamanaka, Fernando Fuzinatto Dall'Agnol, Gilberto Medeiros Ribeiro
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Abstract

We developed an apparatus to measure the work function using a field emission retarding potential (FERP) technique. In this paper, we describe the basics of FERP and the measurement procedures to determine the work function of indium tin oxide (ITO) and aluminum thin films, which are used as electrodes in a large number of Organic Electronic devices. The system developed allows for rapid screening of candidate materials and surface processes for appropriate engineering of device electronic properties.
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真空功功能测量系统
我们开发了一种利用场发射延迟电位(FERP)技术测量功函数的装置。在本文中,我们描述了FERP的基本原理和测量程序,以确定铟锡氧化物(ITO)和铝薄膜的功函数,这是在大量的有机电子器件中用作电极。所开发的系统允许快速筛选候选材料和表面工艺,以进行适当的器件电子特性工程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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