Further Analysis of Laser-induced IR-drop

W. Cruz, R. Viera, J. Dutertre, J. Rigaud, G. Hubert
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Abstract

Studies on laser induced IR-drop are recent and still not much covered. Since laser-induced IR-drop can amplify the well-known effects of induced photoelectric currents in ICs, this work aims to present important characteristics of such effect. Understanding the characteristics and effects of laser induced IR-drop in ICs allows the elaboration of more accurate simulation models, and consequently helps in the design of countermeasures that mitigate the effects of laser illumination. Simulations and experiments were performed in order to understand the relationship of the laser pulse width and the decoupling capacitance of the power supply network with the induced IR-drop. The results showed that the maximum variation of the supply voltage depends on the laser pulse duration, and on other circuit characteristics, such as RLC parameters of the supply network. It was possible to observe by simulations and experiments that, for the proposed circuit, the maximum variation of the supply voltage occurred for a laser pulse greater than or equal to 1 μs. Regarding the decoupling capacitance variation, the results showed that for a decoupling capacitor up to 100 pF, the IR-drop becomes even more relevant with a variation up to 97% of VDD.
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激光诱导红外下降的进一步分析
激光诱导红外下降的研究是最近才开始的,目前还不是很多。由于激光诱导的IR-drop可以放大ic中众所周知的感应光电电流效应,因此本工作旨在呈现这种效应的重要特征。了解集成电路中激光诱导的红外下降的特性和影响,可以建立更精确的仿真模型,从而有助于设计减轻激光照明影响的对策。为了了解激光脉冲宽度和供电网络的去耦电容与感应红外降的关系,进行了仿真和实验。结果表明,供电电压的最大变化取决于激光脉冲持续时间和供电网络的RLC参数等其他电路特性。通过模拟和实验可以观察到,对于所提出的电路,电源电压的最大变化发生在激光脉冲大于或等于1 μs时。关于去耦电容的变化,结果表明,对于高达100 pF的去耦电容,ir降与VDD变化的97%更加相关。
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