Development of a New Long Stroke Nanopositioning System With Modular Pantograph Compliant Mechanism

Abstract

Recently, nanopositioning became one of the most indispensable technologies used in fabrication and characterization processes of micro-electromechanical systems (MEMS). Most of these processes require a positioning system that can achieve tens of millimeters stroke with a nanometer- range precision at the same time, which is impossible to achieve with conventional positioning stages. In this paper, a long stroke hybrid nanopositioning stage is presented. The proposed hybrid system consists of a new magnifying modular pantograph compliant piezo-actuated mechanism mounted above a long- stroke ball screw driven stage. This mechanism can compensate for the positioning errors of the underlying ball screw driven stage and achieve such requirements of nanometer-range precision at the same time. The dynamic model of the whole system is proposed in detail and its control system structure. Finally, the results are presented to verify the positioning accuracy of the hybrid system.