Computing stress tests for interconnect defects

Abstract

Reliability screens are used to reduce infant mortality. The quality of the stress test set used during. The screening process has a direct bearing on the effectiveness of the screen. We have formally studied the problem of computing good quality stress tests for some commonly occurring defects like gate-oxide shorts and interconnect defects. Methods to compute stress tests for gate-oxide defects have been discussed elsewhere. Here we present a formal study of the problem of computing stress rests for interconnect defects.