{"title":"Fabrication of Na0.5K0.5NbO3 Thin Film on Glass Substrate by Pulsed Laser at Room Temperature","authors":"Weiping Zhou, Furong Liu, Chao He, Jimin Chen","doi":"10.1109/SOPO.2012.6271006","DOIUrl":null,"url":null,"abstract":"In this paper, a novel method of fabricate lead-free piezoelectric sodium potassium niobate [(K,Na)NbO3,KNN] thin films was proposed. The KNN thin films were directly sintered on glass substrate at room temperature by pulsed laser. And all of the steps do not need vacuum conditions. Compared with conventional preparation techniques, such as RF-magnetron sputtering and metal-organic chemical vapor deposition (MOCVD), this method is more simpler and faster. The surface morphology of KNN thin film was observed with scanning electron microscopy (SEM), phase composition and structure were characterized by X-ray diffraction (XRD). These results indicate that the KNN thin film was succeeded fabricated by the method.","PeriodicalId":159850,"journal":{"name":"2012 Symposium on Photonics and Optoelectronics","volume":"138 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 Symposium on Photonics and Optoelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOPO.2012.6271006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this paper, a novel method of fabricate lead-free piezoelectric sodium potassium niobate [(K,Na)NbO3,KNN] thin films was proposed. The KNN thin films were directly sintered on glass substrate at room temperature by pulsed laser. And all of the steps do not need vacuum conditions. Compared with conventional preparation techniques, such as RF-magnetron sputtering and metal-organic chemical vapor deposition (MOCVD), this method is more simpler and faster. The surface morphology of KNN thin film was observed with scanning electron microscopy (SEM), phase composition and structure were characterized by X-ray diffraction (XRD). These results indicate that the KNN thin film was succeeded fabricated by the method.