Reliability issues related to Fast Charge Loss Mechanism in Embedded Non Volatile Memories

P. Mora, S. Renard, G. Bossu, P. Waltz, G. Pananakakis, G. Ghibaudo
{"title":"Reliability issues related to Fast Charge Loss Mechanism in Embedded Non Volatile Memories","authors":"P. Mora, S. Renard, G. Bossu, P. Waltz, G. Pananakakis, G. Ghibaudo","doi":"10.1109/IRWS.2006.305213","DOIUrl":null,"url":null,"abstract":"In this work, we report on a thorough study of charge loss in embedded non volatile memories. We focused on the fast initial threshold voltage (Vth) shift, which occurs during the first minutes of data retention bake. Experiments were performed to have a better understanding of this phenomenon. As a result, we can predict the Vth shift of a cell baked at 250degC and evaluate its impact on product reliability. This is the first time that this reliability aspect is characterized with such a level of accuracy. Based on these observations, a physical model is proposed to describe the fast initial threshold voltage shift","PeriodicalId":199223,"journal":{"name":"2006 IEEE International Integrated Reliability Workshop Final Report","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Integrated Reliability Workshop Final Report","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.2006.305213","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7

Abstract

In this work, we report on a thorough study of charge loss in embedded non volatile memories. We focused on the fast initial threshold voltage (Vth) shift, which occurs during the first minutes of data retention bake. Experiments were performed to have a better understanding of this phenomenon. As a result, we can predict the Vth shift of a cell baked at 250degC and evaluate its impact on product reliability. This is the first time that this reliability aspect is characterized with such a level of accuracy. Based on these observations, a physical model is proposed to describe the fast initial threshold voltage shift
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
嵌入式非易失性存储器中快速充电损耗机制的可靠性问题
在这项工作中,我们报告了嵌入式非易失性存储器中电荷损失的深入研究。我们关注的是快速初始阈值电压(Vth)移位,它发生在数据保留烘烤的前几分钟。为了更好地理解这一现象,人们进行了实验。因此,我们可以预测在250℃下烘烤的电池的第v次位移,并评估其对产品可靠性的影响。这是该可靠性方面第一次具有如此高的准确性。基于这些观察结果,提出了一个描述快速初始阈值电压漂移的物理模型
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Product Reliability Trends, Derating Considerations and Failure Mechanisms with Scaled CMOS Lithography CD Variation effects on LFNDMOS Transistor Hot-Carrier Degradation Study of Electrically Programmable Fuses through Series of I-V Measurements A Critical Failure Source in 65nm-MLC NOR Flash Memory Incorporating Co-Salicidation Process Modeling of Dispersive Transport in the Context of Negative Bias Temperature Instability
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1