Controlled Surface Contamination to Determine Surface Sensitivity of HVICS

J. Osenbach, R. Comizzoli, S. S. Voris
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引用次数: 2

Abstract

We report a technique that allows one to deposit on devices a controllable level of contamination as low as 108 atoms/cm2. Using this technique we were able to determine that surface contamination alone does not lead to reduced breakdown voltage of our high voltage PIN diodes. Good devices are essentially immune to surface contamination; however, "bad" devices are very sensitive to contamination. Contamination on the order of 1010 atoms/cm2 reduces the breakdown voltage of a defective diode by over 100V. We have proposed one possible model which describes the dependence of the breakdown voltage of a high voltage device on the applied bias, concentration of contamination, and field plate design. This model is based on the double layer theory of ionic solutions.
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控制表面污染以确定HVICS的表面灵敏度
我们报告了一种技术,该技术允许在设备上沉积低至108个原子/cm2的可控污染水平。使用这种技术,我们能够确定表面污染本身不会导致我们的高压PIN二极管的击穿电压降低。好的设备基本上不受表面污染的影响;然而,“坏”设备对污染非常敏感。1010个原子/cm2量级的污染使有缺陷二极管的击穿电压降低超过100V。我们提出了一个可能的模型来描述高压器件的击穿电压与施加偏置、污染浓度和场极板设计的依赖关系。该模型基于离子溶液的双层理论。
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