Exploring Carbon Nanotubes for VLSI Interconnects

J. A. Santos, T. Kelly, M. S. Ullah
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引用次数: 2

Abstract

As a result of a decrease in cross-section, increases have been noted in several thermal and electrical properties of copper interconnects. To mitigate such concerns, new approaches are being considered for new wiring solutions for VLSI technologies. The incorporation of carbon nanotubes (CNTs) in VLSI design to replace existing interconnection material, may be an efficient and cost-effective evolution from current materials. Carbon nanotubes, more specifically multi-walled carbon nanotubes (MWCNT), have been identified as potential alternatives to diminish such concerns. This paper will delineate the shared and differing aspects of each of the CNT structures.
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探索碳纳米管在VLSI互连中的应用
由于横截面的减小,铜互连的一些热学和电学性能有所增加。为了减轻这种担忧,人们正在考虑为VLSI技术提供新的布线解决方案。在超大规模集成电路设计中引入碳纳米管(CNTs)来取代现有的互连材料,可能是对现有材料的一种高效和经济的发展。碳纳米管,更具体地说是多壁碳纳米管(MWCNT),已经被确定为减少这些担忧的潜在替代品。本文将描述每个碳纳米管结构的共享和不同方面。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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