Investigating the Fine Microstructure of Mn-doped SnAgCu Solder Alloys by Selective Electrochemical Etching

O. Krammer, T. Hurtony
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引用次数: 2

Abstract

In our research the fine microstructure was compared between manganese-doped SnAgCuand traditional SAC305 (Sn96.5/Ag3/Cu0.5) solder alloys. The composition of the manganese-doped alloys was (Sn/Ag0.3/Cu0.7/Mn-x), where x is 0.1, 0.4, 0.7% wt%Solder bumps were prepared on FR4 testboards with reflow soldering technology. After the soldering, cross-sections of the samples were prepared and were investigated by Scanning Electron Microscopy. Backscattered Electrons detector was utilised and EDX (energy-dispersive Xray spectroscopy) analysis were performed. Samples were etched with selective electrochemical etching in order to reveal the fine microstructure of the samples prepared from the conventional and from manganese-doped SAC alloys. It was found that precipitates with relatively high Mn formed in the solder joint, which can influence the mechanical properties of the solder bulk. The manganese altered the formation of Cu-Sn intermetallic compounds, which were formed in very sharp, needle-like structures Additionally, particle-type Ag3 Sn intermetallic compounds readily formed next to the Mn precipitates; they are not distributed uniformly in the solder bulk at all.
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选择性电化学蚀刻法研究mn掺杂SnAgCu钎料合金的微观结构
在我们的研究中,比较了掺杂锰的snagcu和传统的SAC305 (Sn96.5/Ag3/Cu0.5)钎料合金的微观组织。掺锰合金的组成为(Sn/Ag0.3/Cu0.7/Mn-x),其中x分别为0.1、0.4、0.7% wt%,采用回流焊技术在FR4测试板上制备钎料凸点。焊接后,制备样品的横截面,并用扫描电镜观察。利用背散射电子探测器,进行能量色散x射线光谱分析。采用选择性电化学刻蚀法对样品进行刻蚀,以揭示常规和掺锰SAC合金制备的样品的微观结构。结果表明,在焊点中形成了Mn含量较高的析出物,影响了钎料体的力学性能。锰改变了Cu-Sn金属间化合物的形成,形成了非常尖锐的针状结构,并且在Mn析出物旁边容易形成颗粒型Ag3 Sn金属间化合物;它们在焊料块中根本不均匀分布。
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