Visible and Infrared Luminescence and Applications of Er-doped AlN Thin Films

Zhiyuan Wang, Feihong Zhang, S. Golovynskyi, Zhenhua Sun, Baikui Li, Honglei Wu
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Abstract

An Er3+-doped AlN film has been prepared by radio frequency magnetron sputtering and its photoluminescence (PL) characteristics were studied. It shows high PL efficiency in a wide range of the visible (540 and 560 nm) and infrared (817, 864, 980 and 1534 nm) ranges. In the transition of 4f levels of Er3+, the PL from 2H11/24I15/2 and 4S3/24I15/2 shows obvious temperature dependence, which exhibits a functional relationship between their PL intensity ratio I540nm/I560nm and temperature over 100-550 K. It has a relatively high sensitivity (little above 0.01 K-1) among the currently researched temperature sensing materials and can be used as a new contactless temperature sensor in a harsh environment. In the field of infrared luminescence, 864 and 1534 nm are the low loss transmission window in silica fibers and suitable for communication systems.
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掺铒AlN薄膜的可见光和红外发光及其应用
采用射频磁控溅射法制备了Er3+掺杂AlN薄膜,并对其光致发光特性进行了研究。它在可见光(540和560 nm)和红外(817、8664、980和1534 nm)范围内显示出较高的PL效率。在Er3+的4f能级跃迁过程中,从2H11/2→4I15/2和4S3/2→4I15/2的PL表现出明显的温度依赖性,它们的PL强度比I540nm/I560nm与100-550 K温度之间表现出函数关系。它在目前研究的感温材料中具有较高的灵敏度(略高于0.01 K-1),可作为一种新型的非接触式温度传感器应用于恶劣环境。在红外发光领域,864和1534 nm是二氧化硅光纤的低损耗传输窗口,适用于通信系统。
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