Investigating the annealing effect on the conventional growth of ZnO nanorod through electrical characterization

R. Prasad, U. Hashim, K. L. Foo, M. Shafiq
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引用次数: 1

Abstract

Zinc oxide nanorods was synthesized by using hydrothermal growth due to simplicity and involve low temperature processing that is 930C. Low temperature processing is very essential for ZnO nanorod synthesis because defect on developing nano-device can be avoided. Development of nano-device with minimal defect is essential to ensure that the performances of the nano device is optimum for sensing bio-molecular substances. Zinc oxide has become the most remarkable choice among other metal oxides semiconductor due to many criteria such as economical cost, unique physical and electrical properties and biocompatible. Initially, ZnO thin films was prepared by using sol gel method. The ZnO seed solution was prepared using conventional sol-gel route. Zinc oxide solution was prepared in two different solvents which are isopropanol (IPA) and methanol (MeOH) in order to investigate the influence of solvent to the quality of ZnO nanorods. MEA, the sol stabilizer was added to the solution for the following 2 hours. Aluminum IDE electrode was deposited on the silicon wafer sample <;100> using traditional wet etching method. Positive photoresist (PR) was coated on the silicon wafer and followed with soft back for 90 seconds. IDE pattern transfer was done by exposing UV light (365nm) onto the PR for 10 seconds. After that, developing and etching process occurred for pattern transfer the IDE electrode onto the silicon wafer. The prepared seed solution was coated on silicon wafer by using speed coating method. Some of the coated samples underwent annealing process at temperature 2000C for 2 hours. The annealed and non-annealed sample undergoes hydrothermal growth method to synthesize ZnO nanorods. The synthesized nanorods underwent I-V test and capacitances to investigate the electrical behavior of ZnO nanorods. The annealed ZnO nanorods provided higher current, which was 900μA, as compared the non-annealed ZnO nanorods which was only 55 μA.
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通过电学表征研究了退火对ZnO纳米棒常规生长的影响
采用水热法合成氧化锌纳米棒,工艺简单,低温处理温度为930℃。低温工艺对于ZnO纳米棒的合成是至关重要的,因为低温工艺可以避免在制备纳米器件时出现缺陷。开发缺陷最小的纳米器件是保证纳米器件在传感生物分子物质时具有最佳性能的关键。氧化锌因其经济的成本、独特的物理和电学性能以及生物相容性等诸多标准而成为半导体金属氧化物中最引人注目的选择。首先,采用溶胶-凝胶法制备ZnO薄膜。采用常规溶胶-凝胶法制备ZnO种子溶液。在异丙醇(IPA)和甲醇(MeOH)两种不同溶剂中制备氧化锌溶液,考察溶剂对氧化锌纳米棒质量的影响。MEA,在溶液中加入溶胶稳定剂2小时。采用传统的湿法刻蚀法在硅片样品上沉积铝IDE电极。将正性光刻胶(PR)涂在硅片上,然后用软背涂敷90秒。将紫外光(365nm)照射在PR上10秒,完成IDE图案转移。然后,将IDE电极的图案转移到硅片上,进行显影和蚀刻过程。将制备好的种子溶液用快速镀膜法涂覆在硅片上。部分包覆样品在2000℃下退火2小时。对退火和未退火样品进行水热生长法制备ZnO纳米棒。对合成的纳米棒进行了I-V测试和电容测试,研究了ZnO纳米棒的电学行为。与未退火ZnO纳米棒相比,退火ZnO纳米棒提供了更高的电流,为900μA,而未退火ZnO纳米棒只有55 μA。
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