Effect of annealing temperature on electrical and optical properties of ZnO thin films prepared by sol gel method

M. Hannas, A. Manut, Nurul Hafizah A. Rahman, A. B. Rosli, M. Rusop
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引用次数: 6

Abstract

In this work, ZnO thin films were deposited on glass substrates using spin coating method. Different annealing temperature from 400 to 550°C significantly distresses the nature of electrical and optical properties of ZnO thin films have been investigated. The effect of annealing temperature on optical and electrical properties of nanostuctured ZnO thin films deposited by spin coating method has been studied. The optical properties were characterized by ultraviolet visible (UV-VIS-NIR) spectrophotometer. The electrical properties were analyzed using I-V measurement (CEP 2000). Gold (Au) was used as a metal contact using electron beam thermal evaporator (ULVAC). The optical transmittance spectrums showed the average transmittance of ZnO thin film with different annealing temperature higher than 90% in visible wavelength region. The optical band properties of the nanostructured ZnO thin films were analyzed by UV Vis and Tauc method was accepted to estimate the optical gap and absorption coefficient. The resistivity of the film decreased as the annealing temperature increased from 400 to 550oC. The highest conductivity values of ZnO thin film was obtained at 500°C with value 0.000197 Scm-1. Moreover, the higher porosity was found at 400oC with value 57.5%. The higher porosity of ZnO thin film can be expected the high sensitivity for gas sensor due to the material has a comparatively large surface area.
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退火温度对溶胶-凝胶法制备ZnO薄膜电学和光学性能的影响
本研究采用自旋镀膜法在玻璃基板上沉积ZnO薄膜。研究了400 ~ 550℃不同退火温度对ZnO薄膜电学和光学性质的影响。研究了退火温度对自旋镀膜法制备纳米ZnO薄膜光电性能的影响。用紫外可见分光光度计(UV-VIS-NIR)表征了其光学性质。利用I-V测量(CEP 2000)分析了其电性能。利用电子束热蒸发器(ULVAC),采用金(Au)作为金属触点。透射光谱显示,不同退火温度下ZnO薄膜在可见光区的平均透射率均高于90%。采用紫外可见光谱分析了纳米结构ZnO薄膜的光学带性质,并采用tac法估计了其光隙和吸收系数。从400℃到550℃,薄膜的电阻率随退火温度的升高而降低。ZnO薄膜在500℃时电导率最高,为0.000197 cm-1。在400℃时孔隙率较高,为57.5%。由于ZnO薄膜具有较大的表面积,因此其孔隙率越高,气体传感器的灵敏度越高。
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