In depth thermal analysis of packaged GaN on Si power devices

Chieh-An Wang, Hsin-Ping Chou, Stone Cheng, Po-Chien Chou
{"title":"In depth thermal analysis of packaged GaN on Si power devices","authors":"Chieh-An Wang, Hsin-Ping Chou, Stone Cheng, Po-Chien Chou","doi":"10.1109/ISPSD.2013.6694406","DOIUrl":null,"url":null,"abstract":"AlGaN/GaN high electron mobility transistors (HEMTs) are one of the prospective candidates for high switching frequency power electronics applications thanks to its wide band gap (3.4eV), high breakdown voltage, large critical electric field, high carrier mobility, and the inherent high speed characteristics. With the high power densities that AlGaN/GaN HEMTs are capable of reaching, heat dissipation is a crucial issue. This paper presents the thermal analysis of packaging development, the device is attached on a V-groove copper base, and mounted on TO-3P leadframe to enhance Si substrate thermal dissipation. The effects of structure design and fabrication processes on the device performance as well as thermal resistance were studied. In addition, micro-Raman/Infrared (IR) thermography was used to investigate temperature profiles and hot spot of the devices. Simulations provide key insights into device operation and the thermal mechanisms that affect reliability. After incorporating self-heating effect in calculations of current-voltage characteristics, our results agreed well with experimental data.","PeriodicalId":175520,"journal":{"name":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","volume":"152 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 25th International Symposium on Power Semiconductor Devices & IC's (ISPSD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2013.6694406","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4

Abstract

AlGaN/GaN high electron mobility transistors (HEMTs) are one of the prospective candidates for high switching frequency power electronics applications thanks to its wide band gap (3.4eV), high breakdown voltage, large critical electric field, high carrier mobility, and the inherent high speed characteristics. With the high power densities that AlGaN/GaN HEMTs are capable of reaching, heat dissipation is a crucial issue. This paper presents the thermal analysis of packaging development, the device is attached on a V-groove copper base, and mounted on TO-3P leadframe to enhance Si substrate thermal dissipation. The effects of structure design and fabrication processes on the device performance as well as thermal resistance were studied. In addition, micro-Raman/Infrared (IR) thermography was used to investigate temperature profiles and hot spot of the devices. Simulations provide key insights into device operation and the thermal mechanisms that affect reliability. After incorporating self-heating effect in calculations of current-voltage characteristics, our results agreed well with experimental data.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
对封装GaN基硅功率器件进行了深入的热分析
AlGaN/GaN高电子迁移率晶体管(hemt)具有宽带隙(3.4eV)、高击穿电压、大临界电场、高载流子迁移率和固有的高速特性,是高开关频率电力电子应用的潜在候选者之一。由于AlGaN/GaN hemt能够达到高功率密度,散热是一个关键问题。本文介绍了封装开发的热分析,该器件安装在v型槽铜底座上,并安装在to - 3p引线框架上,以增强Si衬底的散热。研究了结构设计和制作工艺对器件性能和热阻的影响。此外,利用微拉曼/红外(IR)热成像技术研究了器件的温度分布和热点。模拟提供了对器件操作和影响可靠性的热机制的关键见解。将自热效应纳入电流-电压特性计算后,所得结果与实验数据吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
JFET pinched bootstrap diode (JPBD) without substrate leakage current integration to 120V BCDMOS process Comparison of theoretical limits between superjunction and field plate structures A segmented gate driver IC for the reduction of IGBT collector current over-shoot at turn-on HB1340 ℄ Advanced 0.13um BCDMOS technology of complimentary LDMOS including fully isolated transistors Injection control technique for high speed switching with a double gate PNM-IGBT
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1