R. Sheffield, B. Carlsten, K. C. Dominic Chan, J. Goldstein, M. Lynch, B. Newnam, D. Nguyen, D. Prono, R. Warren
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引用次数: 1
Abstract
We present the design and calculated performance for a 20-W XUV-FEL source for 60-nm projection lithography. The compact design features an 85-MeV rf linear accelerator with photoinjector, and a pulsed microwiggler with multifacet resonator optics.
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