{"title":"A new vector 2D photolithography simulation tool","authors":"K. Lucas, A. Strojwas","doi":"10.1109/IEDM.1992.307336","DOIUrl":null,"url":null,"abstract":"A new vector optical lithography simulator, METROPOLE, is presented. Rigorous simulations run quickly on a workstation for complex 2D regular and phase shifting masks, substrate bleaching, optical metrology and alignment problems. An analysis of a novel phase shifting techniques is undertaken to highlight the usefulness of the program.<<ETX>>","PeriodicalId":287098,"journal":{"name":"1992 International Technical Digest on Electron Devices Meeting","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1992 International Technical Digest on Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1992.307336","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
A new vector optical lithography simulator, METROPOLE, is presented. Rigorous simulations run quickly on a workstation for complex 2D regular and phase shifting masks, substrate bleaching, optical metrology and alignment problems. An analysis of a novel phase shifting techniques is undertaken to highlight the usefulness of the program.<>
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