S. Roshchupkin, V. Storizhko, O. Denisenko, A. I. Voroshilo, S. Starodub, V. N. Nedoreshta, B. Sulkio-Cleff
{"title":"Influence of relativistic and quantum effects on the blur in projection lithography systems","authors":"S. Roshchupkin, V. Storizhko, O. Denisenko, A. I. Voroshilo, S. Starodub, V. N. Nedoreshta, B. Sulkio-Cleff","doi":"10.1109/LFNM.2003.1246096","DOIUrl":null,"url":null,"abstract":"Classical and quantum effects producing changes in the blur for electronand- ion (H/sup +/ and He/sup +/) projection lithography are theoretically considered. Typically, the systems studied in this report operate with beam current up to 200 /spl mu/A and beam voltage up to 200 keV. The influence of a strong laser field on the interaction of beam particles into crossover is theoretically investigated. It is predicted, that for intensities of a laser field and for defined parameters of a beam, the effective potential of interaction of beam particles becomes a potential of attraction. It is shown, that this effect allows correcting the blur effect. The influence of quantum effects into crossover on blur is theoretically studied. It is shown, that for sufficiently strong currents and close-cut beams, the corrections due to quantum effects into crossover can have essential influence on blur.","PeriodicalId":368970,"journal":{"name":"5th International Workshop on Laser and Fiber-Optical Networks Modeling, 2003. Proceedings of LFNM 2003.","volume":"56 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-11-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"5th International Workshop on Laser and Fiber-Optical Networks Modeling, 2003. Proceedings of LFNM 2003.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LFNM.2003.1246096","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Classical and quantum effects producing changes in the blur for electronand- ion (H/sup +/ and He/sup +/) projection lithography are theoretically considered. Typically, the systems studied in this report operate with beam current up to 200 /spl mu/A and beam voltage up to 200 keV. The influence of a strong laser field on the interaction of beam particles into crossover is theoretically investigated. It is predicted, that for intensities of a laser field and for defined parameters of a beam, the effective potential of interaction of beam particles becomes a potential of attraction. It is shown, that this effect allows correcting the blur effect. The influence of quantum effects into crossover on blur is theoretically studied. It is shown, that for sufficiently strong currents and close-cut beams, the corrections due to quantum effects into crossover can have essential influence on blur.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
