Qingsong Gong, Genke Yang, Moon-sang Lee, Changchun Pan
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引用次数: 1
Abstract
The double EWMA (exponential-weighted-moving-average) controller, as one kind of R2R (Run to Run) controller has been widely used in the industrial process, especially in semiconductor manufacturing. In this paper, two forms of the most popular double EWMA controller are analysed and compared in terms of the stability conditions and long-run performance. We point out their own advantages and disadvantages in use and present each own applicable situations. Finally, a specific chemical mechanical polishing (CMP) process will be used as an example to illustrate the validity of our results.
双指数加权移动平均(EWMA)控制器作为R2R (Run to Run)控制器的一种，在工业过程特别是半导体制造中得到了广泛的应用。本文从稳定性条件和长期运行性能两方面分析比较了目前最流行的两种形式的双EWMA控制器。指出了它们在使用中的优缺点，并提出了各自的适用情况。最后，以化学机械抛光(CMP)工艺为例，说明了研究结果的有效性。
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