High Pillar Doping Concentration for SiC Superjunction IGBTs

H. Kang, F. Udrea
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引用次数: 1

Abstract

This paper is a theoretical study of the optimum doping concentration for the n and p pillars of a superjunction IGBT. As the concentration of the pillar for a silicon-carbide superjunction device increases up to 10 times higher than that of silicon, unipolar drift current in each pillar can be predominant over the bipolar action. The increased doping concentration effectively reduces the potential drop in the pillar for the on-state conduction.
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SiC超结igbt的高柱掺杂浓度
本文对超结IGBT中n柱和p柱的最佳掺杂浓度进行了理论研究。当碳化硅超结器件柱的浓度增加到硅的浓度的10倍时,每个柱中的单极漂移电流可以超过双极作用。增加的掺杂浓度有效地降低了导通柱的电位下降。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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