{"title":"Flash Lamp Annealing Latest Technology for 45nm device and Future devices","authors":"H. Kiyama","doi":"10.1109/RTP.2006.367983","DOIUrl":null,"url":null,"abstract":"FLA (flash lamp annealing) is used in 65nm generation devices manufacturing. For next 45nm and future generation devices, we have picked up 3 key subjects related to milli-second annealing: process controllability, S/D (source drain) activation, silicidation. No need to say, process controllability is very important for device manufacturing. And process requirement for S/D activation and silicidation controllability is becoming more and more severe. Under evaluation of these subjects, it became clear that FLA technology is still a hopeful candidate for 45nm device and future","PeriodicalId":114586,"journal":{"name":"2006 14th IEEE International Conference on Advanced Thermal Processing of Semiconductors","volume":"78 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 14th IEEE International Conference on Advanced Thermal Processing of Semiconductors","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RTP.2006.367983","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
FLA (flash lamp annealing) is used in 65nm generation devices manufacturing. For next 45nm and future generation devices, we have picked up 3 key subjects related to milli-second annealing: process controllability, S/D (source drain) activation, silicidation. No need to say, process controllability is very important for device manufacturing. And process requirement for S/D activation and silicidation controllability is becoming more and more severe. Under evaluation of these subjects, it became clear that FLA technology is still a hopeful candidate for 45nm device and future
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