An analytical approach for modelling of a top gated graphene based MOSFET

Jith Sarker, A. S. M. Z. Shifat
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Abstract

In the neoteric years, Graphene is one of the predominant resplendence in the horizon of fabrication technology owing to some of its tremendous electronic properties like zero band gap, high saturation velocity, higher electrical conductivity and so on. Graphene based devices are now being deliberated as one of possible options for post Si based electronics era. In this paper, we have analyzed the miscellaneous idiosyncratics of top gated graphene metal oxide semiconductor field effect transistor (MOSFET). Surface potential dependent quantum capacitance is obtained self-consistently along with linear and square root approximation. Gate voltage dependence of surface potential has been shown. Output characteristics, transfer characteristics of the proposed device model have been investigated. Considering all of the graphical illustrations, we strongly recommend Graphene to be a fellow replacement of silicon based devices in future MOSFET applications.
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顶门控石墨烯基MOSFET的建模分析方法
石墨烯以其零带隙、高饱和速度、高导电性等优异的电子性能,成为近年来制造技术领域的一大亮点。石墨烯基器件现在被认为是后硅基电子时代的可能选择之一。本文分析了顶门控石墨烯金属氧化物半导体场效应晶体管(MOSFET)的各种特性。根据线性近似和平方根近似,得到了与表面电位相关的量子电容。表明了栅极电压对表面电位的依赖性。研究了所提出的器件模型的输出特性、传输特性。考虑到所有的图形插图,我们强烈建议石墨烯在未来的MOSFET应用中作为硅基器件的替代品。
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