Characterization and thermal analysis of a 48 V GaN HFET device technology for wireless infrastructure applications

B. Green, H. Henry, J. Selbee, F. Clayton, K. Moore, M. CdeBaca, J. Abdou, C.L. Liu, O. Hartin, D. Hill, M. Miller, C. Weitzel
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引用次数: 4

Abstract

This report presents the DC, pulsed I–V, small signal, and large signal characteristics of Freescale’s 48 V GaN HFET technology. Characterization of large signal performance for a 12.6 mm at 48V drain bias shows 89 W output power with an associated power density of 7.1 W/mm, linear gain of 17.5 dB, and a power-added efficiency (PAE) of 62%. Analysis of channel temperature over drain bias shows that the maximum channel temperatures at 28 V and 48 V are 107 °C and 245 °C, respectively during saturated RF operation. Data for RF drift over time on a 16.2 mm device show less than 0.2 dB of RF drift for ≫1000 hrs. of testing. This level of RF performance represents a significant ≫4 dB gain and ≫2 W/mm power density improvement over Freescale’s previously reported GaN HFET technology.
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用于无线基础设施应用的48 V GaN HFET器件技术的特性和热分析
本报告介绍了飞思卡尔48 V GaN HFET技术的直流、脉冲I-V、小信号和大信号特性。在48V漏极偏置下,12.6 mm的大信号性能表征显示,输出功率为89 W,相关功率密度为7.1 W/mm,线性增益为17.5 dB,功率附加效率(PAE)为62%。通道温度过漏偏置分析表明,饱和RF工作时,28v和48v的最大通道温度分别为107°C和245°C。在16.2 mm器件上随时间的射频漂移数据显示,在1000小时内,射频漂移小于0.2 dB。的测试。与飞思卡尔先前报道的GaN HFET技术相比,这一射频性能水平有了显著的4 dB增益和2 W/mm功率密度的提高。
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