Realization of High Aspect Ratio and Surface Defects in YZO Nanorods via Controlling Seed Layer Thickness

N. Kaur, Sejoon Lee, D. Kim
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Abstract

High-aspect-ratio Y-doped ZnO (YZO) nanorods were grown vertically on YZO-seeded Si substrates by using a hydrothermal method. The aspect ratios of YZO nanorods were altered by controlling the thicknesses of as-grown and 600 oC-annealed YZO seed layers. The highest aspect ratio of YZO nanorods was observed to be ~ 49.3 by controlling the growth and in-situ etching process of 600 oC-annealed YZO seed layers. Well-aligned YZO nanorods showed a single crystalline behavior corresponding to the preferential (002) orientation of the hexagonal wurtzite structure. PL and XPS results revealed that the surface defects were significantly increased with an increase of aspect ratio of YZO nanorods grown on the thicker as-grown and 600 oC-annealed seed
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通过控制种子层厚度实现YZO纳米棒的高纵横比和表面缺陷
采用水热法制备了高纵横比y掺杂ZnO (YZO)纳米棒。通过控制生长和600℃退火的YZO种子层的厚度,改变了YZO纳米棒的纵横比。通过控制600 oc退火YZO种子层的生长和原位刻蚀工艺,观察到YZO纳米棒的最高长径比为~ 49.3。排列良好的YZO纳米棒表现出单晶行为,与六方纤锌矿结构的优先取向(002)相对应。PL和XPS结果表明,随着YZO纳米棒长径比的增加,其表面缺陷显著增加
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