Preparation of Poly (methyl methacrylate) thin film Capacitors on ITO-glass substrate

Ali S. Ali, Karema M. Zaidan, Adnan Issa Al-Badran
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Abstract

In electronic devices, some important materials having a high dielectric constant can be used. Polymer-ceramic composites have a high dielectric constant and are widely used for embedded capacitor applications. It is critical to use polymer poly methyl methacrylate (PMMA) as thin films capacitors for the gate dielectric in organic field-effect transistors (OFETs). In this work, thin films of polymer PMMA were prepared by using spin coating at different speeds (1500, 2000, 2500, 3000 and 3500 rpm) to control the film thickness and study the effect of the thickness on the dielectric properties. Thin film thickness was measured by using field emission scanning electron microscopy (FESEM) to take cross-section images. We found that the film thickness decreased with increased rotational speed from 27387 nm at 1500 rpm to 10600 nm at 3500 rpm. The values of the capacities were nearly stable with increasing frequencies when thickness equal to or larger than (14366 nm), but their increased with increased frequency at thickness (10600 nm), and the dielectric constant also decreases with increasing thin films thickness. The best result of capacitance value was at thickness 10600nm which equal to (5.753 nF) and dielectric constant equal to (3.511) which represents best value that can be used as dielectric gate for Organic Field Effect Transistor (OFET).
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ito玻璃基板上聚甲基丙烯酸甲酯薄膜电容器的制备
在电子器件中,可以使用一些具有高介电常数的重要材料。聚合物-陶瓷复合材料具有较高的介电常数,广泛应用于嵌入式电容器中。高分子聚合物聚甲基丙烯酸甲酯(PMMA)作为薄膜电容器用于有机场效应晶体管(ofet)的栅极介电介质是至关重要的。本文采用不同转速(1500、2000、2500、3000和3500转/分)的自旋镀膜方法制备了聚合物PMMA薄膜,并研究了薄膜厚度对介电性能的影响。采用场发射扫描电子显微镜(FESEM)对薄膜进行了厚度测量。我们发现薄膜厚度随着转速的增加而减小,从1500 rpm时的27387 nm到3500 rpm时的10600 nm。当薄膜厚度等于或大于(14366 nm)时,电容值随频率的增加基本稳定,但当薄膜厚度为(10600 nm)时,电容值随频率的增加而增加,且介电常数随薄膜厚度的增加而减小。在厚度为10600nm处电容值最佳,为(5.753 nF),介电常数为(3.511),可作为有机场效应晶体管(OFET)的介电栅极。
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