Different responses between undoped and N-doped few-layer graphene based photonic devices

Wenrong Wang, Tie Li, Yuxiu Zhou, C. Liang, Yuelin Wang
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Abstract

In this paper, undoped and N-doped few-layer graphene (FLG) films were synthesized by ambient pressure chemical vapor deposition. The different photoresponse between these two kinds of FLG based photonic devices was discussed. Photoconductive and photovoltaic responses were found respectively in undoped and N-doped FLG based photonic devices. Under IR lamp illumination in vacuum, the resistance changed in undoped FLG based device while photocurrent at zero voltage bias was found in N-doped FLG based device. The photoconductive effect was enhanced as the temperature decreased, on the contrary, the photocurrent was found to decrease as the temperature decreased from room temperature to 78K.
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未掺杂和n掺杂石墨烯光子器件的不同响应
本文采用常压化学气相沉积法制备了未掺杂和掺n的少层石墨烯(FLG)薄膜。讨论了这两种基于FLG的光子器件的不同光响应。在未掺杂和掺n的FLG基光子器件中分别发现了光导和光伏响应。在真空红外光照射下,未掺杂FLG器件的电阻发生变化,而掺n FLG器件的光电流为零电压偏置。光导效应随着温度的降低而增强,而光电流则随着温度从室温降低到78K而减小。
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