Photomasks and the enablement of circuit design complexity

Abstract

Photomasks have evolved from simple replicators of design layout for lithography to become complex translators of design intent for sub-wavelength imaging systems while at the same time maintaining a cost efficiency that exceeds Moore's Law predictions for scalability in the semiconductor industry. The cost performance of photomasks is reviewed in context to design costs. The life cycle of a photomask product node is examined with respect to capital investment costs. Predictions for future photomask cost challenges are considered.